PROCESS RHYSICS SCIENCE

KAZUO TERASHIMA & TSUYOHITO ITO LAB.

MESSAGE

99% OF THE VISIBLE UNIVERSE IS IN THE PLASMA STATE ANDTODAY’S TECHNOLOGIES AND DEVICES SUCH AS COMPUTERS, SMARTPHONES ETC., WOULD NOT BE A REALITY WITHOUT PLASMA PROCESSING OUR RESEARCH FOCUSES ON THE DEVELOPMENT OF NEW, EXOTIC PLASMAS, TO PUSH THE FRONTIERS OF MATERIALS RESEARCH EVEN FURTHER.

Plasma Materials Science is evolving as a major foundation for the development of advanced technological materials that find application in a large variety of emerging fields such as biotechnology, pharmaceutics and medicine, opto- and nanoelectronics. To address the challenges that the fabrication of new nanomaterials demands, the development of novel plasma techniques that allow to synthesize and process materials more efficiently, economically and ecologically, is necessary. This requires an interplay between different scientific and engineering disciplines. We hope to attract highly motivated students who are capable to ‘think outside of the box’ and are interested to work in an exceptionally interdisciplinary field and a research group that fosters international collaboration and exchange.

keyword

Supercritical fluid plasma / Supercritical fluid / Plasma / Cryoplasma / Materials process / STM / Materials processing / Microplasma / Plasma process / Emission spectroscopy / Plasma processing / Carbon nanomaterials / Plasma environment / Plasma-solid interface / supercritical fluid / Thin film Deposition / CNx / Plasma chip / Low temperature plasma / plasma etching / Surface and interface process engineering / Materials processing /Ma / Nanomaterials / AFM / SPM / Multiprobe / Nanoscale plasma / Micro plasma / Plasma environment STM / Deep space / Mass spectrometry / IR absorption spectroscopy / Red matter / Environmental simulator / Ice planet / Outer solar system / Tough composite / Aqua process / In-situ SEM observation / Acoustic emission / Composite materials / Submerged plasma / Cyclodynamic polymer / Advanced aqua plasma composite material process / Separation / Field emission / Liquid / Material processing / Electron beam / Microparticles / Surface treatment process / Electron beam excited solution plasma / Electron beam excited plasma / Magnetic dust plasma / Magnetic fine particles / Three-dimensional plasma crystal / In supercritical fluid / Dust plasma / Supercritical fluid dust plasma / Cu thin film / carbon nano-structured materials / cleaning / deposition / surface treatment / supercritical cluster plasma fluid / supercritical cluster plasma / deposition / material surface processing process / Cu thin film / cleaning / film formation process / supercritical plasma cluster fluid / carbon nanostructured materials / materials synthesis / thin film deposition / surface modification / dielectric barrier discharge / low-temperature plasma / supercritical fluid plasma / supercritical plasma / carbon nanomaterials / material synthesis / surface treatment /
Laser processing / plasma processing / plasma diagnosis / material surface treatment / clustering / dielectric barrier discharge / Solution Plasma chip / Plasma fiber / Carbon nano-materials / Atmospheric plasma jet / Supercritical fluid plasma / Supercritical fluid / Materials processing / Microplasma / Substance Exploration / Atmospheric pressure microplasma jet / Laser-induced microplasma / Plasma paper / Laser-induced plasma / Atmospheric non-equilibrium plasma / Supercritical fashionable plasma / Material device process / Plasma fiber / Atmospheric pressure plasma jet / Plasma computer simulation / Carbon system / Plasma CVD / Plasma Chip / Microscale Plasma / Plasma simulation / Highly integrated process equipment / Plasma calculation simulation / Plasma calculation simulation / Carbon / Plasma CVD / microscale fabrication / cold plasma / thermal plasma / plasma optical emission spectroscopy / VHF plasma / microscale plasma / Nonequilibrium plasma / Piezo system / RF microplasma / Plasma emission spectroscopy / VEF plasma / Microfabrication / Thermal plasma / Microemission spectroscopy / VHF plasma / nano-scopic structure / plasma-solid interface / SPM (scanning probe microscopy) / cold glow plasma / HOPG / solid-plasma interface / nanoscopic structure / plasma etching reaction / plasma surface processing / atomic image / etching / plasma-solid surface interface / STM (scanning tunneling)
microscope) / Plasma environment / Plasma material surface processing / Plasma-solid interface / Lattice image / Plasma surface / Etching / Plasma material surface process / plasma STM / multiprobe / nanoplasma / microplasma / Micro Langmuir method / Nanoscale-plasma / Micro Plasma / Plasma etching / processing / Semi in-situ characterization / Methane-Hydrogen system CVD / Substrate / Diamond thin film / Atmospheric pressure/low vacuum environment / Nanoprocessing / Semi in-situ evaluation / Processing / Semi in-situ evaluation / Methane- Hydrogen-based CVD / Substrate for nanoprocessing / Material surface processing / Supercritical ion beam / Ion beam / Plasma ashing / Porous materials / Cryo / Plasma surface treatment / Low dielectric constant materials / Nanoporous materials / Bonding parameters / Plasma parameters / Ashing /
Cryogenic temperature / Plasma generation / Cluster / Supercritical cluster fluid plasma / Density fluctuation / Nano interface / Supercritical cluster fluid / Diamondoid / Cluster / Plasma electronics / Diamond molecule / Density fluctuation / Critical point / Supercritical cluster fluid / Self-assembly / Discharge mode phase transition / Atmospheric pressure cryoplasma / Atmospheric pressure plasma / Hydrophilic treatment / Surface modification / Microwave plasma / Annular gel / Cluster material synthesis / Sliding gel / Nanobubble plasma / Cluster material synthesis / Nanopulse plasma / Air Liquid mixed phase / Nano space-time / Ultra-high density plasma / Micro Langmuir probe method / Lithography / Piezo actuator / Microscale plasma / Exotic plasma / Nanoscale world

PROFILE : Professor Kazuo Terashima

1982 Bachelor of Science from Faculty of Engineering, The University of Tokyo
1984 Master of Science from Faculty of Engineering, The University of Tokyo
1987 Research Associate, Faculty of Engineering, The University of Tokyo
1988 Dr. of Engineering from Faculty of Engineering, The University of Tokyo
1990 Lecturer, Faculty of Engineering, The University of Tokyo
1992 Associate Professor, faculty of Engineering, The University of Tokyo
1993-1995 University of Basel (Switzerland): Guest Professor
1999 Associate Professor, Graduate School of Frontier Sciences, The University of Tokyo
2009 Professor, Graduate School of Frontier Sciences, The University of Tokyo

Associate Professor Tsuyohito Ito

keyword

STUDENT VOICE : KENICHI INOUE

Our laboratory research team conducts innovative studies, from which you can find a unique research theme. The atmosphere is positive and lively, and each student can work according to t he student’s research style. Professor Terashima is a great researcher with extensive knowledge and always seeks new perspectives. As an educator, he gives students the opportunity to study. Associate Professor Ito offers friendly consultations and provides accurate research guidance. Advanced plasma science is a frontier field for everyone, with new areas for further development. Although the first step is challenging, discoveries always motivate us.

Kazuo Terashima & Tsuyohito Ito Lab.,
Department Of Advanced Materials Science,
Graduate School of Frontier Sciences,
The University of Tokyo
Kashiwanoha 5-1-5,
Kashiwa,Chiba 277-8561, Japan

+81-4-7136-3797,3799(Terashima)
kazuo@plasma.k.u-tokyo.ac.jp
+81-4-7136-3782(Ito)
tsuyohito@plasma.k.u-tokyo.ac.jp

The Goal of Applied Physics

The goal of Applied Physics is to develop a stage = “new material” that can manipulate undeveloped degrees of freedom, to explore unknown phenomena created from that stage and to bring out excellent functions, and to bring out its excellent functions. The purpose is to contribute to the development of human society by elucidating the mechanisms and developing application fields for these phenomena and functions.

AMS (Advanced Materials Science)

Department Office
AMS (Advanced Materials Science),
Graduate School of Frontier Sciences,
The University of Tokyo
Kashiwanoha 5-1-5, Kashiwa, Chiba 277-8561, Japan
Email : ams-office(at)ams.k.u-tokyo.ac.jp
Please change (at) to @.