Dr. T. Takashi Onaya, Research Associate, Kita Research Group (https://www.scio.t.u-tokyo.ac.jp/top-eng.html), Department of Advanced Materials Science, won the Best Paper Award at the 15th Silicon Technology Division, the Japan Society of Applied Physics (https://www.jsap.or.jp/english) meeting 2023. The award ceremony was held during the 71st JSAP Spring Meeting 2024 (https://meeting.jsap.or.jp/english) held March 22-25 at the Setagaya Campus of Tokyo City University.

Title of the Paper:
Wake-up-free properties and high fatigue resistance of HfxZr1-xO2-based metal-ferroelectric-semiconductor using top ZrO2 nucleation layer at low thermal budget (300 °C)", APL Materials vol. 10, pp. 051110-1-7 (2022)

Authors:
Takashi Onaya, Toshihide Nabatame, Mari Inoue, Tomomi Sawada, Hiroyuki Ota, and Yukinori Morita

Note that the content of this paper is a part of the outcomes of joint research with the National Institute for Materials Science (NIMS) and the National Institute of Advanced Industrial Science and Technology (AIST).

From left: Dr. Jiro Ida (Kanazawa Institute of Technology, Chief Secretary of STD), Dr. Takashi Onaya, Dr. Toshihide Nabatame (NIMS), Mr. Tomomi Sawada (NIMS), Dr. Yukinori Morita (AIST), Dr. Osamu Nakatsuka (Nagoya University, Deputy Chief Secretary of STD)