Mr. Haruki Yoshida, a first-year master's student at Kita Research Group (https://www.scio.t.u-tokyo.ac.jp/top-eng.html), the Department of Advanced Materials Science, was awarded the Yukio Yasuda Award for Poster Presentation (Young Researcher's Award) at the 30th Workshop on Electron Device Interface Technology (https://edit-ws.jp/)  held in Numazu City, Shizuoka from January 22 to 24, 2025.

Presentation Title:
Difference of factors to determine the surface N density saturation behaviors between N radical nitridation and NO annealing nitridation on 4H-SiC surfaces

List of Awardees: https://edit-ws.jp/awards/